Previous close | 22.00 |
Open | 21.80 |
Bid | 0.00 x N/A |
Ask | 0.00 x N/A |
Day's range | 21.80 - 21.80 |
52-week range | 18.80 - 26.40 |
Volume | |
Avg. volume | 0 |
Market cap | N/A |
Beta (5Y monthly) | N/A |
PE ratio (TTM) | N/A |
EPS (TTM) | N/A |
Earnings date | 13 May 2024 |
Forward dividend & yield | N/A (N/A) |
Ex-dividend date | N/A |
1y target est | N/A |
Toppan Photomask, the world's premier semiconductor photomask provider, announced that it has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. This agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.