TOPPAN Holdings Inc. (TPX.F)

Toppan Photomask Signs Agreement with IBM for Joint R&D on Semiconductor EUV Photomasks

Toppan Photomask, the world's premier semiconductor photomask provider, announced that it has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. This agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.